What is UNN cut off mark for Pure / Applied Chemistry 2020/2021? If you want to know the cut off mark of University of Nigeria, Nsukka for Pure / Applied Chemistry in UNN then am very happy to inform you that UNN cut off mark for Pure / Applied Chemistry has been made available here in this post.
Having made the introduction above concerning UNN Cut Off Mark required to study Pure / Applied Chemistry, This is a notice to all candidates that UNN Pure / Applied Chemistry cut off mark for 2020/2021 academic session has been released by the management of University of Nigeria, Nsukka.
Before we proceed, let us do a brief introduction on what Pure / Applied Chemistry cut off mark is all about. First of all, cut off mark is a minimum mark or score that is required in JAMB for a candidate who wish to gain admission into a particular school.
Therefore, Pure / Applied Chemistry cut off mark is a minimum mark or score that a candidate who wish to study and be considered for admission into Pure / Applied Chemistry in University of Nigeria, Nsukka need to score in JAMB result before the person can apply for admission.
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So, for you to gain admission into UNN to study the course in question; you need to pass the UNN Cut Off Mark that has been set by the management specifically for those intending to study Pure / Applied Chemistry.
UNN Cut Off Mark for Pure / Applied Chemistry
Without wasting much time, take note that UNN cut off mark for Pure / Applied Chemistry is 180. To gain admission to study Pure / Applied Chemistry in UNN, you need to have scored exactly 180 or above in JAMB before you can qualify to buy University of Nigeria, Nsukka post UTME form and be considered for admission.You can also checkout JAMB Cut off mark here.
To be on the safer side, you need to score higher than the UNN cut off mark provided above for you to have a higher edge of getting admission to study Pure / Applied Chemistry. See JAMB subject combination for Pure / Applied Chemistry here or you can check JAMB subject combination for all courses here.
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